| 2006 | Bincheng Li
Holger Blaschke
Detlev Ristau
: Combined laser calorimetry and photothermal technique for absorption measurement of optical coatings. In: Applied Optics
, 2006, 5827-5831 |
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| 2006 | Bincheng Li
Holger Blaschke
Detlev Ristau: Pulsed photothermal deflection with top-hat beam excitation. In: Journal of Applied Physics, 2006, 053509 |
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| 2005 | Bincheng Li, Shengming Xiong, Yundong Zhang, S. Martin, and E. Welsch: Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens. In: Optics Communications, 2005, 367-376 |
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| 2002 | Bincheng Li, S. Martin, and E. Welsch: Laser conditioning and nonlinear absorption og LaF3/MgF2 dielectric multilayers at 193 nm. In: Applied Physics A, 2002, 27-33 |
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| 2001 | Bincheng Li, S. Martin, and E. Welsch, Different conditioning and absorption behavior of fluoride material
combinations for dielectric multilayers at 193nm
. In: SPIE, 2001, 82-92 |
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| 2000 | Bincheng Li, S. Martin, and E. Welsch: In Situ measurement on ultravoilet dielectric components by pulsed top-hat beam thermal lens. In: Applied Optics, 2000, 4690-4697 |
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| 2000 | Bincheng Li, W. Theobald, E. Welsch, and R. Sauerbrey: Optimization of grating size in chirped pulse amplification laser system. In: Applied Physics B, 2000, 819-826 |
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| 2000 | Bincheng Li, S. Martin, E. Welsch, R. Thielsch, J. Heber, and N. Kaiser: Pulsed top-hat thermal lens: A simple and sensitive tool for in situ measurements on ultravoilet dielectric components. In: SPIE, 2000, 470-478 |
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| 2000 | Bincheng Li, L. Pottier, J. P. Roger, D. Fournier, and E. Welsch: Thermal characterization of film-on-substrate systems with modulated thermoreflectance microscopy. In: Review of Scientific Instruments, 2000, 2154-2160 |
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| 2000 | Bincheng Li, S. Martin, and E. Welsch: Thermoelastic influence of substrate on damage threshold of ultraviolet dielectric coatings. In: SPIE, 2000, 145-155 |
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| 2000 | H. Blaschke, W. Arens, D. Ristau, S. Martin, B.C.Li, and E. Welsch Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. In: SPIE , 2000, 242-249 |
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